1184
Highly stable organic bisradicals protected by mechanical bonds, (K. Cai, H. Mao, W.-G. Liu, Y. Qiu, Y. Shi, L. Zhang, D. Shen, H. Chen, Y. Jiao, H. Wu, Z. Liu, Y. Feng, C. L. Stern, M. R. Wasielewski, W. A. Goddard III, J. F. Stoddart), J. Am. Chem. Soc. 2020, 142, 7190–7197.